| M. J. Pellin, J. W. Elam, J. Norem, C. Antoine, L. Cooley, Th. Proslier, J. Zasadzinski, R. Rimmer, J. F. Moore
|
Atomic Layer Deposition (ALD) is a technique for synthesizing materials
in single atomic layers[1]. We are studying ALD as a method for producing
highly controlled surfaces for superconducting RF (SCRF) systems. We have
begun tests of ALD coatings of single cells that will involve RF measurements
of a cell before and after ALD coating at Argonne. In addition to the tests on
complete cells, we are also beginning a program of point contact tunneling
measurements to determine the properties of the superconductors at the
interface between the bulk niobium and the oxide layer. Herein we describe
the method, and ongoing initial tests with single cell resonators and small samples. |
