|Initial tests of Atomic Layer Deposition(ALD)coatings for superconducting RF Systems|
|M. J. Pellin, J. W. Elam, J. Norem, C. Antoine, L. Cooley, Th. Proslier, J. Zasadzinski, R. Rimmer, J. F. Moore|
Atomic Layer Deposition (ALD) is a technique for synthesizing materials in single atomic layers. We are studying ALD as a method for producing highly controlled surfaces for superconducting RF (SCRF) systems. We have begun tests of ALD coatings of single cells that will involve RF measurements of a cell before and after ALD coating at Argonne. In addition to the tests on complete cells, we are also beginning a program of point contact tunneling measurements to determine the properties of the superconductors at the interface between the bulk niobium and the oxide layer. Herein we describe the method, and ongoing initial tests with single cell resonators and small samples.